Photoresist is a material used as a mask in the fabrication of microelectronic devices that are consumables and become waste. Therefore, photoresists that contain organic materials that are eco-friendly, recyclable, natural and low cost are necessary to be developed. The main component of photoresist is material that is sensitive to light exposure because when exposed to light the material is chemically reacted. Photoresist research using natural materials has been carried out and shown promising results. Materials synthesized and extracted from natural materials such as mangosteen peel, banana flower, and purple yam peel have good sensitivity to ultraviolet (UV) exposure, so that these materials have the potential to be used as UV-photeresist. The pattern produced after UV exposure process and exposed resist development in a developer solution is very clear in micron size. This study aims to compile, compare and analyze briefly the use of natural materials for photoresists and to compare the performance of these photoresists to UV exposure. The photoresist properties include density, sensitivity and resolution.